Search results for "Silicon photonics"
showing 10 items of 28 documents
First experimental demonstration of a plasmonic MMI switch in 10 Gb/s true data traffic conditions
2012
We report the first experimental performance evaluation of a 75 um long plasmonic MMI switch, hetero-integrated on a SOI platform, operating with 10Gb/s data signals. The switch exhibits 2.9μs response time and 44.5% modulation depth while its extinction ratio varies from 5.4 to -1.5 dB for 35mW switching power. Error-free performance was achieved.
Extraordinary tuning of a nanocavity by a near-field probe
2011
Abstract We report here an experimental observation of an extraordinary near-field interaction between a local probe and a small-volume solid-state nanocavity. We directly compare the normally observed near-field interaction regime driven by the perturbation theory and then report the extraordinary interaction regime. Subsequently, we show that the cavity can take up to 2 min to recover from this interaction after removing the probe and that leads to an extraordinary blue-shift of the cavity resonance wavelength (∼15 nm) which depends on the probe motion above the cavity and not the position. The reasons for this effect are not fully understood yet but we try to give some explanations.
2D Waveguided Bessel Beam Generated Using Integrated Metasurface-Based Plasmonic Axicon.
2020
International audience; Near-field imaging of the propagation of a diffraction-free Bessel-type beam in a guided wave configuration generated by means of a metasurface-based axicon lens integrated on a silicon waveguide is reported. The operation of the axicon lens with a footprint as small as 11 μm2 is based on local engineering of the effective index of the silicon waveguide with plasmonic nanoresonators. This generic approach, which can be adapted to different types of planar lightwave circuit platforms, offers the possibility to design nano-engineered optical devicesbased on the use of plasmonic resonators to control light at the nanoscale.
Integrated Optical Technique for Detection of Electro-Optical Non-Linearities in Thin Films
1976
A simple method for detection of electro-optical non-linearities in thin films is presented. The method involves an easily fabricated structure and a little practice in integrated optical techniques. It is also possible to detect small induced variations of refractive index, using lower voltage with respect to those applied in a conventional Kerr cell. We have sucessfully tested our method using two different polymer materials as thin films. In both of these we have observed an induced ?n ? 3 10?5 with an electric field of 60 V/?, with a response time round about 300 nsec. The experimental values of induced ?n versus electric field fit very well a parabola, proving the quadratic behavior of…
Incoherent solitons and condensation processes
2006
International audience; We study the nonlinear interaction of partially incoherent nonlinear optical waves. We show that, in spite of the incoherence of the waves, coherent phase effects may play a relevant role during the propagation, in contrast with the usual wave turbulence description of the interaction. These nonlinear phase effects may lead the system to unexpected processes of self-organization, such as condensation, or incoherent soliton generation in instantaneous response nonlinear media. Such self-organization processes may be characterized by a reduction of the non-equilibrium entropy, which violates the Boltzmann's H-theorem of entropy growth inherent to the wave turbulence th…
Tb/s switching fabrics for optical interconnects using heterointegration of plasmonics and silicon photonics: The FP7 PLATON approach
2010
We present recent work that is carried out within the FP7 project PLATON on novel Tb/s switch fabric architectures and technologies for optical interconnect applications, employing heterointegration of plasmonics, silicon photonics and electronics.
Telecom to mid-infrared supercontinuum generation in a silicon germanium waveguide
2015
We report the first demonstration of broadband supercontinuum generation in silicon-germanium waveguides. Upon propagation of ultra-short femtosecond pulses in a 3-cm-long waveguide, the broadening extended from 1.455µm to 2.788µm (at the −30-dB point).
Optical propagation loss measurements in electro optical host-guest waveguides
2013
Thin organic waveguiding layers are applied more and more frequently as optical components in novel optoelectronic devices. For development of such devices it is important to know the optical properties of the used waveguides. One of the most important parameters is optical propagation loss in the waveguide. In this paper we present optical propagation loss measurements in planar electro optical waveguides using travelling fiber method. Using this method attenuation coefficient α at 633 nm as a function of chromophore concentration for the first two guiding modes in the slab waveguide was determined.
Guiding and reflecting light by boundary material
2003
We study effects of finite height and surrounding material on photonic crystal slabs of one- and two-dimensional photonic crystals with a pseudo-spectral method and finite difference time domain simulation methods. The band gap is shown to be strongly modified by the boundary material. As an application we suggest reflection and guiding of light by patterning the material on top/below the slab.
Recess photomask contact lithography and the fabrication of coupled silicon photonic and plasmonic waveguide switches
2015
Display Omitted A lithography technique capable of printing submicron-sized features inside deep cavities is presented.A so-called recess photomask adapted to the wafer's topography is employed.Based on a standard mask aligner, Recess Photomask Contact Lithography has moderate cost.Its efficiency for a photonic/plasmonic switch application was demonstrated experimentally.The technique is extensible to any design and to wafers with multiple level recesses. A novel lithographic method is presented, based on the use of a mask aligner in the contact mode with a modified photomask, the so-called recess photomask; its goal is the printing of submicron-sized patterns into deep cavities of a chip, …